ArticleACS applied nano materials2023
Plasmonic Titanium Nitride Nanohole Arrays for Refractometric Sensing.
Article in ACS applied nano materials, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
6 citing papers in PubMed.
- Plasmon-Enhanced Raman Sensing with Metal-Insulator-Metal Metasurfaces.ACS applied materials & interfaces · 2026Article
- TiN Plasmonic Metamaterial Arrays Fabricated at Low Temperatures on Versatile Substrates.ACS applied optical materials · 2025Article
- Synthesis of Free-Standing Alloyed Plasmonic ZrSmall (Weinheim an der Bergstrasse, Germany) · 2025Article
- Thermally Robust Plasmonic Nanorings from Titanium Nitride.ACS omega · 2025Article
- High-Performance Plasmonic Hafnium Nitride Nanocavity and Nanodisk Arrays for Enhanced Refractometric Sensing.ACS applied materials & interfaces · 2025Article
- Optical and Plasmonic Properties of High-Electron-Density Epitaxial and Oxidative Controlled Titanium Nitride Thin Films.The journal of physical chemistry. C, Nanomaterials and interfaces · 2025Article
Corrections and comments
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Authors and funding
10 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Group IVB metal nitrides have attracted great interest as alternative plasmonic materials. Among them, titanium nitride (TiN) stands out due to the ease of deposition and relative abundance of Ti compared to those of Zr and Hf metals. Even though they do not have Au or Ag-like plasmonic characteristics, they offer many advantages, from high mechanical stability to refractory behavior and complementary metal oxide semiconductor-compatible fabrication to tunable electrical/optical properties. In this study, we utilized reactive RF magnetron sputtering to deposit plasmonic TiN thin films. The flow rate and ratio of Ar/N
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Registered trials
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