Evidence map›Paper›PMID 37937382›Full record

ReviewAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2024

Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors.

Mohd Zahid Ansari, Iftikhar Hussain, Debananda Mohapatra, Sajid Ali Ansari, Reza Rahighi, Dip K Nandi, Wooseok Song, Soo-Hyun Kim

Abstract readReview
In one paragraph

Review in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.

0numbers the graph read from it
0cells of the map it votes in
10citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

10 citing papers in PubMed.

  1. Sulfur-Doped SnOACS omega · 2026
    Article
  2. Article
  3. Review
  4. Article
  5. Review
  6. Ultrasonic disorder-induced deposition of TiOUltrasonics sonochemistry · 2025
    Article
  7. Article
  8. Article
  9. Article
  10. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Mohd Zahid AnsariSchool of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongbuk, 38541, Republic of Korea.ORCID https://orcid.org/0000-0002-3028-4505
Iftikhar HussainDepartment of Mechanical Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowoon, Hong Kong.
Debananda MohapatraGraduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea.
Sajid Ali AnsariDepartment of Physics, College of Science, King Faisal University, P.O. Box 400, Hofuf, Al-Ahsa, 31982, Saudi Arabia.
Reza RahighiSKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea.
Dip K NandiPlessey Semiconductors Ltd, Tamerton Road Roborough, Plymouth, Devon, PL6 7BQ, UK.
Wooseok SongThin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, 34114, Republic of Korea.
Soo-Hyun KimGraduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea.ORCID https://orcid.org/0000-0003-3748-2755

Funding

Ministry of Science and ICT 2021M3H4A3A02099208Ministry of Trade, Industry & Energy 20024909National Research Foundation of Korea
6 · The paper itself

Abstract

Atomic layer deposition (ALD) has become the most widely used thin-film deposition technique in various fields due to its unique advantages, such as self-terminating growth, precise thickness control, and excellent deposition quality. In the energy storage domain, ALD has shown great potential for supercapacitors (SCs) by enabling the construction and surface engineering of novel electrode materials. This review aims to present a comprehensive outlook on the development, achievements, and design of advanced electrodes involving the application of ALD for realizing high-performance SCs to date, as organized in several sections of this paper. Specifically, this review focuses on understanding the influence of ALD parameters on the electrochemical performance and discusses the ALD of nanostructured electrochemically active electrode materials on various templates for SCs. It examines the influence of ALD parameters on electrochemical performance and highlights ALD's role in passivating electrodes and creating 3D nanoarchitectures. The relationship between synthesis procedures and SC properties is analyzed to guide future research in preparing materials for various applications. Finally, it is concluded by suggesting the directions and scope of future research and development to further leverage the unique advantages of ALD for fabricating new materials and harness the unexplored opportunities in the fabrication of advanced-generation SCs.

Indexed as

atomic layer deposition (ALD)electrode architecture designselectrode materialsperformance optimizationthin films

Identifiers

PMID37937382
PMCPMC10767429

What OpenQuestion holds

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LicenceCC BY
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.