ArticleACS photonics2023
Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography.
Article in ACS photonics, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- Advances in waveguide to waveguide couplers for 3D integrated photonic packaging.Light, science & applications · 2026Review
- Multiphoton and Harmonic Imaging of Microarchitected Materials.ACS applied materials & interfaces · 2025Article
- Hybrid achromatic microlenses with high numerical apertures and focusing efficiencies across the visible.Nature communications · 2023Article
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Authors and funding
11 authors.
Funding
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Abstract
Multiphoton lithography inside a mesoporous host can create optical components with continuously tunable refractive indices in three-dimensional (3D) space. However, the process is very sensitive at exposure doses near the photoresist threshold, leading previous work to reliably achieve only a fraction of the available refractive index range for a given material system. Here, we present a method for greatly enhancing the uniformity of the subsurface micro-optics, increasing the reliable index range from 0.12 (in prior work) to 0.37 and decreasing the standard deviation (SD) at threshold from 0.13 to 0.0021. Three modifications to the previous method enable higher uniformity in all three spatial dimensions: (1) calibrating the planar write field of mirror galvanometers using a spatially varying optical transmission function which corrects for large-scale optical aberrations; (2) periodically relocating the piezoelectrically driven stage, termed piezo-galvo dithering, to reduce small-scale errors in writing; and (3) enforcing a constant time between each lateral cross section to reduce variation across all writing depths. With this new method, accurate fabrication of optics of any index between
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Registered trials
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