Evidence map›Paper›PMID 37636914›Full record

ArticleACS omega2023

Effect of Rapid Thermal Annealing on Si-Based Dielectric Films Grown by ICP-CVD.

Irina Parkhomenko, Liudmila Vlasukova, Fadei Komarov, Nataliya Kovalchuk, Sergey Demidovich, Ainur Zhussupbekova, Kuanysh Zhussupbekov, Igor V Shvets, Oleg Milchanin, Dmitry Zhigulin and 1 more

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In one paragraph

Article in ACS omega, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

11 authors.

Irina ParkhomenkoBelarusian State University, Kurchatov Str. 5, 220045 Minsk, Belarus.ORCID https://orcid.org/0000-0003-0982-3938
Liudmila VlasukovaBelarusian State University, Kurchatov Str. 5, 220045 Minsk, Belarus.
Fadei KomarovA.N. Sevchenko Institute of Applied Physical Problems of Belarusian State University, Kurchatov Str. 7, 220045 Minsk, Belarus.
Nataliya KovalchukJoint Stock Company "Integral", Kazintsa Str. 121 A, 220108 Minsk, Belarus.
Sergey DemidovichJoint Stock Company "Integral", Kazintsa Str. 121 A, 220108 Minsk, Belarus.
Ainur ZhussupbekovaSchool of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin D02 PN40, Ireland.ORCID https://orcid.org/0000-0003-2724-8762
Kuanysh ZhussupbekovSchool of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin D02 PN40, Ireland.ORCID https://orcid.org/0000-0003-1909-3270
Igor V ShvetsSchool of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin D02 PN40, Ireland.
Oleg MilchaninA.N. Sevchenko Institute of Applied Physical Problems of Belarusian State University, Kurchatov Str. 7, 220045 Minsk, Belarus.
Dmitry ZhigulinJoint Stock Company "Integral", Kazintsa Str. 121 A, 220108 Minsk, Belarus.
Ivan RomanovBelarusian State University, Kurchatov Str. 5, 220045 Minsk, Belarus.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Silicon nitride, silicon oxide, and silicon oxynitride thin films were deposited on the Si substrate by inductively coupled plasma chemical vapor deposition and annealed at 1100 °C for 3 min in an Ar environment. Silicon nitride and silicon oxide films deposited at ratios of the reactant flow rates of SiH

Identifiers

PMID37636914
PMCPMC10448691

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.