Evidence map›Paper›PMID 37629812›Full record

ArticleMaterials (Basel, Switzerland)2023

Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications-Effects of Precursor and Operating Conditions.

Vladyslav Matkivskyi, Oskari Leiviskä, Sigurd Wenner, Hanchen Liu, Ville Vähänissi, Hele Savin, Marisa Di Sabatino, Gabriella Tranell

Open access · goldAbstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Materials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
1.2field-weighted citation impact, top 22% of its field
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed, 9 citations in OpenAlex.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors at 3 institutions in 2 countries.

Vladyslav MatkivskyiDepartment of Materials Science and Engineering, Norwegian University of Science and Technology, Alfred Getz vei 2B, 7034 Trondheim, Norway.ORCID 0000-0003-3844-8559
Oskari LeiviskäDepartment of Electronics and Nanoengineering, Aalto University, Tietotie 3, 02150 Espoo, Finland.ORCID 0009-0009-8897-8348
Sigurd WennerSINTEF Industry, Høgskoleringen 5, 7034 Trondheim, Norway.
Hanchen LiuDepartment of Electronics and Nanoengineering, Aalto University, Tietotie 3, 02150 Espoo, Finland.ORCID 0000-0002-8404-4902
Ville VähänissiDepartment of Electronics and Nanoengineering, Aalto University, Tietotie 3, 02150 Espoo, Finland.ORCID 0000-0002-2681-5609
Hele SavinDepartment of Electronics and Nanoengineering, Aalto University, Tietotie 3, 02150 Espoo, Finland.
Marisa Di SabatinoDepartment of Materials Science and Engineering, Norwegian University of Science and Technology, Alfred Getz vei 2B, 7034 Trondheim, Norway.
Gabriella TranellDepartment of Materials Science and Engineering, Norwegian University of Science and Technology, Alfred Getz vei 2B, 7034 Trondheim, Norway.
Tieto (Finland) · FINorwegian University of Science and Technology · NOSINTEF · NO

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Two widely used atomic layer deposition precursors, Tetrakis (dimethylamido) titanium (TDMA-Ti) and titanium tetrachloride (TiCl

Indexed as

ALD precursorsatomic layer depositionpassivation filmstitanium oxide

Identifiers

PMID37629812
PMCPMC10456286
OpenAlexW4385666461

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.