ArticleMaterials (Basel, Switzerland)2023
Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition.
Article in Materials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
1 citing paper in PubMed, 15 citations in OpenAlex.
- Advanced Strategies for Enhancing the Biocompatibility and Antibacterial Properties of Implantable Structures.Materials (Basel, Switzerland) · 2025Review
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Authors and funding
5 authors at 4 institutions in 2 countries.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of TiN coating. Thin films grown over Si substrate were further characterised to evaluate the morphological properties, surface roughness and mechanical properties using a scanning electrode microscope (SEM), atomic force microscopy (AFM) and nanoindentation, respectively. EDS equipped with SEM showed the presence of Ti and N elements in considerable amounts. TiN morphology obtained from the SEM test showed small-sized particles on the surface along with cracks and pores. AFM results revealed that by increasing the deposition time, the surface roughness of the coating also increased. The nanomechanical properties such as nanohardness (H) and Young's modulus (E), etc., evaluated using the nanoindentation technique showed that higher deposition time led to an increase in H and E. Overall, it was observed that deposition time plays a vital role in the TiN coating deposition using the CVD technique.
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