Evidence map›Paper›PMID 37376785›Full record

ReviewDalton transactions (Cambridge, England : 2003)2023

Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials.

M Chen, M P Nijboer, A Y Kovalgin, A Nijmeijer, F Roozeboom, M W J Luiten-Olieman

Abstract readReview
In one paragraph

Review in Dalton transactions (Cambridge, England : 2003), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.

0numbers the graph read from it
0cells of the map it votes in
7citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

7 citing papers in PubMed.

  1. Article
  2. Article
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  4. Review
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

6 authors.

M ChenInorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.ORCID http://orcid.org/0000-0002-2385-3490
M P NijboerInorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.ORCID http://orcid.org/0000-0001-9319-6871
A Y KovalginIntegrated Devices and Systems, Faculty of Electrical Engineering, Mathematics and Computer Science, MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.ORCID http://orcid.org/0000-0001-7418-7734
A NijmeijerInorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.
F RoozeboomInorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.ORCID http://orcid.org/0000-0003-3925-7041
M W J Luiten-OliemanInorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.ORCID http://orcid.org/0000-0001-5390-4546

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we provide a comprehensive overview of the recent applications and development of ALD approaches emphasizing those based on operation at atmospheric pressure. Each application determines its own specific reactor design. Spatial ALD (s-ALD) has been recently introduced for the commercial production of large-area 2D displays, the surface passivation and encapsulation of solar cells and organic light-emitting diode (OLED) displays. Atmospheric temporal ALD (t-ALD) has opened up new emerging applications such as high-porosity particle coatings, functionalization of capillary columns for gas chromatography, and membrane modification in water treatment and gas purification. The challenges and opportunities for highly conformal coating on porous substrates by atmospheric ALD have been identified. We discuss in particular the pros and cons of both s-ALD and t-ALD in combination with their reactor designs in relation to the coating of 3D and high-porosity materials.

Identifiers

PMID37376785
PMCPMC10392469

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.