Evidence map›Paper›PMID 37368281›Full record

ArticleNanomaterials (Basel, Switzerland)2023

Multi-Level Resistive Al/Ga

Li-Wen Wang, Chih-Wei Huang, Ke-Jing Lee, Sheng-Yuan Chu, Yeong-Her Wang

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Review
  2. GaNanomaterials (Basel, Switzerland) · 2024
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Li-Wen WangDepartment of Electrical Engineering, National Cheng-Kung University, Tainan 701, Taiwan.
Chih-Wei HuangInstitute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan 701, Taiwan.
Ke-Jing LeeInstitute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan 701, Taiwan.ORCID 0000-0001-6607-5759
Sheng-Yuan ChuDepartment of Electrical Engineering, National Cheng-Kung University, Tainan 701, Taiwan.ORCID 0000-0003-2195-7613
Yeong-Her WangInstitute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan 701, Taiwan.ORCID 0000-0003-3796-923X

Funding

Ministry of Science and Technology 108-2221-E-006-040-MY3Ministry of Science and Technology 111-2221-E-006-206
6 · The paper itself

Abstract

Recently, resistive random access memory (RRAM) has been an outstanding candidate among various emerging nonvolatile memories for high-density storage and in-memory computing applications. However, traditional RRAM, which accommodates two states depending on applied voltage, cannot meet the high density requirement in the era of big data. Many research groups have demonstrated that RRAM possesses the potential for multi-level cells, which would overcome demands related to mass storage. Among numerous semiconductor materials, gallium oxide (a fourth-generation semiconductor material) is applied in the fields of optoelectronics, high-power resistive switching devices, and so on, due to its excellent transparent material properties and wide bandgap. In this study, we successfully demonstrate that Al/graphene oxide (GO)/Ga

Indexed as

bilayer structuregallium oxidegraphene oxidemulti-level storageRRAM

Identifiers

PMID37368281
PMCPMC10302128

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.