ReviewNanomaterials (Basel, Switzerland)2023
Atomistic Simulation of Physical Vapor Deposition of Optical Thin Films.
Review in Nanomaterials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
3 citing papers in PubMed.
- Direct Measurement of Density for Evaporated Thin Films.Small methods · 2025Article
- Novel Method for Realistically Simulating the Deposition of Thin Films from the Gas Phase and its Application to Study the Growth of Thin Gold Film on Crystalline Silicon.Journal of chemical theory and computation · 2025Article
- Is the Future of Materials Amorphous? Challenges and Opportunities in Simulations of Amorphous Materials.ACS physical chemistry Au · 2025Review
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Authors and funding
2 authors.
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Abstract
A review of the methods and results of atomistic modeling of the deposition of thin optical films and a calculation of their characteristics is presented. The simulation of various processes in a vacuum chamber, including target sputtering and the formation of film layers, is considered. Methods for calculating the structural, mechanical, optical, and electronic properties of thin optical films and film-forming materials are discussed. The application of these methods to studying the dependences of the characteristics of thin optical films on the main deposition parameters is considered. The simulation results are compared with experimental data.
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Registered trials
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