ArticleNanomaterials (Basel, Switzerland)2023
UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput.
Article in Nanomaterials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.
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Who cites it
7 citing papers in PubMed.
- Plasmonic Nanoarray Biosensors for Non-Invasive Cancer Diagnostics.Biosensors · 2026Review
- Plasmonic and surface-enhanced Raman nanobiosensors for quantitative molecular detection.Discover nano · 2026Review
- Rapid Identification of Trace Pharmacodynamic Substances in Traditional Chinese Medicine via SERS and Deep Learning.Biosensors · 2026Article
- Advances in surface-enhanced Raman scattering applications for precision agriculture: monitoring plant health and crop quality.RSC advances · 2025Review
- Advanced Manufacturing on Nano- and Microscale.Nanomaterials (Basel, Switzerland) · 2025Article
- Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication.International journal of molecular sciences · 2025Review
- Construction and Application of Au NRs/4-MBA/PAM Ratiometric Surface-Enhanced Raman Scattering Substrate for Fish Veterinary Drug Residue Detection.Nanomaterials (Basel, Switzerland) · 2024Article
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5 authors.
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Abstract
A controlled and reliable nanostructured metallic substrate is a prerequisite for developing effective surface-enhanced Raman scattering (SERS) spectroscopy techniques. In this study, we present a novel SERS platform fabricated using ultra-violet nanoimprint lithography (UV-NIL) to produce large-area, ordered nanostructured arrays. By using UV-NIL imprinted patterns in resist, we were able to overcome the main limitations present in most common SERS platforms, such as nonuniformity, nonreproducibility, low throughput, and high cost. We simulated and fabricated C-shaped plasmonic nanostructures that exhibit high signal enhancement at an excitation wavelength of 785 nm. The substrates were fabricated by directly coating the imprinted resist with a thin gold layer. Avoiding the need to etch patterns in silicon significantly reduces the time and cost of fabrication and facilitates reproducibility. The functionality of the substrates for SERS detection was validated by measuring the SERS spectra of Rhodamine 6G.
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