Evidence map›Paper›PMID 37120780›Full record

ReviewNano convergence2023

Applications of remote epitaxy and van der Waals epitaxy.

Ilpyo Roh, Seok Hyeon Goh, Yuan Meng, Justin S Kim, Sangmoon Han, Zhihao Xu, Han Eol Lee, Yeongin Kim, Sang-Hoon Bae

Abstract readReview
In one paragraph

Review in Nano convergence, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.

0numbers the graph read from it
0cells of the map it votes in
10citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

10 citing papers in PubMed.

  1. Article
  2. Article
  3. Article
  4. Thermally Induced Irreversible Disorder in Interlayer Stacking of γ-GeSe.Small (Weinheim an der Bergstrasse, Germany) · 2024
    Article
  5. Article
  6. Review
  7. Article
  8. Article
  9. Review
  10. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Ilpyo Roh *Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Seok Hyeon Goh *Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea.
Yuan MengMechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Justin S KimThe Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
Sangmoon HanMechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Zhihao XuThe Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
Han Eol LeeDivision of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea. haneol@jbnu.ac.kr.
Yeongin KimDepartment of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, OH, 45221, USA. kim4yg@ucmail.uc.edu.
Sang-Hoon BaeMechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA. sbae22@wustl.edu.ORCID http://orcid.org/0000-0002-1518-7635

Funding

national research foundation of korea 2022R1A4A3033320national research foundation of Korea NRF-2022R1F1A1066064
6 · The paper itself

Abstract

Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration.

Indexed as

2DLTFreestanding membraneHeterogeneous integrationRemote epitaxyVan der Waals epitaxy

Identifiers

PMID37120780
PMCPMC10149550

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.