Evidence map›Paper›PMID 37110054›Full record

ArticleMaterials (Basel, Switzerland)2023

On the Quenching of Electron Temperature in Inductively Coupled Plasma.

Inho Seong, Si-Jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shinjae You

Abstract read
In one paragraph

Article in Materials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Inho SeongApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-7228-2698
Si-Jun KimApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0001-7782-7194
Youngseok LeeApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0003-0900-166X
Chulhee ChoApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-6781-1057
Wonnyoung JeongApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Yebin YouApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Minsu ChoiApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Byeongyeop ChoiApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Shinjae YouApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-8306-7643

Funding

Korea Institute for Advancement of Technology P0008458, HRD Program for Industrial InnovationKorea Institute of Energy Technology Evaluation and Planning 20202010100020Korea Institute of Machinery and Materials NK236FKorea Semiconductor Research Consortium (KSRC) 20009818, 20010420, 20019500, 20019473Ministry of Education 2021RIS-004Ministry of Trade, Industry and Energy 1415179040, 1415179069, 1415181071, 1415180221Ministry of Trade, Industry and Energy the Next-Generation Intelli- 192 gence Semiconductor R&D ProgramNational Research Council of Science and Technology CRF-20-01-NFRINational Research Foundation of Korea NRF-2020R1A6A1A03047771
6 · The paper itself

Abstract

Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenching of electron temperature with increasing discharge power has not been fully understood. In this work, we investigated the quenching of electron temperature in an inductively coupled plasma source using Langmuir probe diagnostics, and suggested a quenching mechanism based on the skin effect of electromagnetic waves within local- and non-local kinetic regimes. This finding provides insight into the quenching mechanism and has implications for controlling electron temperature, thereby enabling efficient plasma material processing.

Indexed as

electron temperatureelectron temperature quenchingplasma diagnosticsskin effect

Identifiers

PMID37110054
PMCPMC10141103

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.