ArticleMicrosystems & nanoengineering2023
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation.
Article in Microsystems & nanoengineering, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
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Who cites it
4 citing papers in PubMed.
- Enhancing imaging structure compatibility in surface plasmonic lithographyNanoscale advances · 2026Article
- Thickness Thresholds for Generating Plasmonic Surfaces via Solid-State Dewetting of Ultrathin Silver Films on Soft Polymeric Substrates.ACS omega · 2026Article
- Broadband plasmon modulation and high-intensity nanofocusing for high-resolution nanoscale imaging using Fabry-Pérot probes.Microsystems & nanoengineering · 2026Article
- Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy.Nanoscale advances · 2023Article
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Authors and funding
4 authors.
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Abstract
Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor (
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