Evidence map›Paper›PMID 36984230›Full record

ArticleMaterials (Basel, Switzerland)2023

Efficient Broadband Light-Trapping Structures on Thin-Film Silicon Fabricated by Laser, Chemical and Hybrid Chemical/Laser Treatments.

Michael Kovalev, Ivan Podlesnykh, Alena Nastulyavichus, Nikita Stsepuro, Irina Mushkarina, Pavel Platonov, Evgeniy Terukov, Sergey Abolmasov, Aleksandr Dunaev, Andrey Akhmatkhanov and 2 more

Abstract read
In one paragraph

Article in Materials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.

0numbers the graph read from it
0cells of the map it votes in
4citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

4 citing papers in PubMed.

  1. Article
  2. Advances in Plasma and Laser Engineering.Materials (Basel, Switzerland) · 2024
    Article
  3. Article
  4. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

12 authors.

Michael KovalevLebedev Physical Institute, 119991 Moscow, Russia.ORCID 0000-0001-5074-0718
Ivan PodlesnykhLebedev Physical Institute, 119991 Moscow, Russia.ORCID 0000-0003-3381-2972
Alena NastulyavichusLebedev Physical Institute, 119991 Moscow, Russia.
Nikita StsepuroLebedev Physical Institute, 119991 Moscow, Russia.ORCID 0000-0002-8383-7396
Irina MushkarinaLebedev Physical Institute, 119991 Moscow, Russia.
Pavel PlatonovLaser and Optoelectronic Systems Department, Bauman Moscow State Technical University, 2nd Baumanskaya St. 5/1, 105005 Moscow, Russia.
Evgeniy TerukovDepartment of Electronics, St. Petersburg State Electrotechnical University, ul. Professora Popova 5, 197022 St. Petersburg, Russia.
Sergey AbolmasovR&D Center of Thin Film Technologies in Energetics, 194064 St. Petersburg, Russia.ORCID 0000-0002-8877-8372
Aleksandr DunaevAll-Russian Research Institute for Optical and Physical Measurements, 119361 Moscow, Russia.
Andrey AkhmatkhanovSchool of Natural Sciences and Mathematics, Ural Federal University, 620000 Ekaterinburg, Russia.ORCID 0000-0002-2802-9134
Vladimir ShurSchool of Natural Sciences and Mathematics, Ural Federal University, 620000 Ekaterinburg, Russia.ORCID 0000-0002-6970-7798
Sergey KudryashovLebedev Physical Institute, 119991 Moscow, Russia.ORCID 0000-0001-6657-2739

Funding

Ministry of Science and Higher Education of the Rus-sian Federation Ural Federal University Program of Development within the Priority-2030 Program
6 · The paper itself

Abstract

Light-trapping structures formed on surfaces of various materials have attracted much attention in recent years due to their important role in many applications of science and technology. This article discusses various methods for manufacturing light-trapping "black" silicon, namely laser, chemical and hybrid chemical/laser ones. In addition to the widely explored laser texturing and chemical etching methods, we develop a hybrid chemical/laser texturing method, consisting in laser post-texturing of pyramidal structures obtained after chemical etching. After laser treatments the surface morphology was represented by a chaotic relief of microcones, while after chemical treatment it acquired a chaotic pyramidal relief. Moreover, laser texturing of preliminarily chemically microtextured silicon wafers is shown to take five-fold less time compared to bare flat silicon. In this case, the chemically/laser-treated samples exhibit average total reflectance in the spectral range of 250-1100 nm lower by 7-10% than after the purely chemical treatment.

Indexed as

chemical etchinglaser texturinglight-trappingreflection coefficientsurface microstructures

Identifiers

PMID36984230
PMCPMC10056786

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.