ArticleLangmuir : the ACS journal of surfaces and colloids2023
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor.
Article in Langmuir : the ACS journal of surfaces and colloids, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
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Who cites it
4 citing papers in PubMed.
- AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption Simulations.Journal of chemical theory and computation · 2026Article
- Area-Selective Atomic Layer Deposition through Selective Passivation of SiOChemistry of materials : a publication of the American Chemical Society · 2025Article
- The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes.The journal of physical chemistry letters · 2024Article
- First synthesis of RuSn solid-solution alloy nanoparticles and their enhanced hydrogen evolution reaction activity.Chemical science · 2024Article
Corrections and comments
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Authors and funding
7 authors.
Funding
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Abstract
Area-selective atomic layer deposition using small-molecule inhibitors (SMIs) involves vapor-phase dosing of inhibitor molecules, resulting in an industry-compatible approach. However, the identification of suitable SMIs that yield a high selectivity remains a challenging task. Recently, aniline (C
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Registered trials
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