Evidence map›Paper›PMID 36904724›Full record

ArticleSensors (Basel, Switzerland)2023

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process.

Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You

Full text read
In one paragraph

Article in Sensors (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Si-Jun KimApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0001-7782-7194
Min-Su ChoiApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Sang-Ho LeeDepartment of Plasma Engineering, Korea Institute of Machinery and Materials (KIMM), Daejeon 34104, Republic of Korea.
Won-Nyoung JeongApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Young-Seok LeeApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0003-0900-166X
In-Ho SeongApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-7228-2698
Chul-Hee ChoApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-6781-1057
Dae-Woong KimDepartment of Plasma Engineering, Korea Institute of Machinery and Materials (KIMM), Daejeon 34104, Republic of Korea.
Shin-Jae YouApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.ORCID 0000-0002-8306-7643

Funding

Korea Evaluation Institute of Industrial Technology the Next-Generation Intelli- 253 gence Semiconductor R&D ProgramKorea Institute of Energy Technology Evaluation and Planning 0202010100020Korea Institute of Machinery and Materials NK236FMinistry of Education 2021RIS-004Ministry of Trade, Industry and Energy 20009818, 20010420, 20019500, 2001947Ministry of Trade, Industry and Energy P0008458, HRD Program for Industrial InnovationNational Research Council of Science and Technology CRF-20-01-NFRINational Research Foundation of Korea NRF-2020R1A6A1A03047771
6 · The paper itself

Abstract

The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring electron density uniformity, called the Tele-measurement of plasma Uniformity via Surface wave Information (TUSI) probe. The TUSI probe consists of eight non-invasive antennae and each antenna estimates electron density above the antenna by measuring the surface wave resonance frequency in a reflection microwave frequency spectrum (S11). The estimated densities provide electron density uniformity. For demonstration, we compared it with the precise microwave probe and results revealed that the TUSI probe can monitor plasma uniformity. Furthermore, we demonstrated the operation of the TUSI probe beneath a quartz or wafer. In conclusion, the demonstration results indicated that the TUSI probe can be used as an instrument for a non-invasive in-situ method for measuring electron density uniformity.

Indexed as

electron densityelectron density uniformityin-situ plasma process monitoringplanar microwave probeplasma diagnosticsplasma uniformity

Identifiers

PMID36904724
PMCPMC10006970

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.