Evidence map›Paper›PMID 36711051›Full record

ArticleChemistry of materials : a publication of the American Chemical Society2023

Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO

Giulio D'Acunto, Roman Tsyshevsky, Payam Shayesteh, Jean-Jacques Gallet, Fabrice Bournel, François Rochet, Indiana Pinsard, Rainer Timm, Ashley R Head, Maija Kuklja and 1 more

Abstract read
In one paragraph

Article in Chemistry of materials : a publication of the American Chemical Society, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

11 authors.

Giulio D'AcuntoDepartment of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden.ORCID https://orcid.org/0000-0002-0564-6906
Roman TsyshevskyDepartment of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, United States.
Payam ShayestehDepartment of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden.
Jean-Jacques GalletCNRS Laboratoire de Chimie Physique-Matière et Rayonnement, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.ORCID https://orcid.org/0000-0003-2076-1432
Fabrice BournelCNRS Laboratoire de Chimie Physique-Matière et Rayonnement, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.ORCID https://orcid.org/0000-0001-6452-3415
François RochetCNRS Laboratoire de Chimie Physique-Matière et Rayonnement, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.ORCID https://orcid.org/0000-0001-9316-559X
Indiana PinsardDepartment of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden.
Rainer TimmDepartment of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden.ORCID https://orcid.org/0000-0001-8914-5924
Ashley R HeadCenter for Functional Nanomaterials, Brookhaven National Laboratory, P.O. Box 5000, Upton, New York 11973-5000, United States.ORCID https://orcid.org/0000-0001-8733-0165
Maija KukljaDepartment of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, United States.
Joachim SchnadtDepartment of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden.ORCID https://orcid.org/0000-0001-9375-831X

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The surface chemistry of the initial growth during the first or first few precursor cycles in atomic layer deposition is decisive for how the growth proceeds later on and thus for the quality of the thin films grown. Yet, although general schemes of the surface chemistry of atomic layer deposition have been developed for many processes and precursors, in many cases, knowledge of this surface chemistry remains far from complete. For the particular case of HfO

Identifiers

PMID36711051
PMCPMC9879184

What OpenQuestion holds

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.