ArticleBeilstein journal of nanotechnology2023
Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning.
Article in Beilstein journal of nanotechnology, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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3 citing papers in PubMed, 6 citations in OpenAlex.
- Ethanol-Assisted Alkanethiol Self-Assembled Monolayer Disruption by Mobile Siloxane Oligomers for Precise Galvanic Replacement Positioning.ACS applied materials & interfaces · 2026Article
- Resonant laser excitation for nanoscale photocatalytic gold growth on patterned templates.Scientific reports · 2026Article
- Molecular nanoarchitectonics: unification of nanotechnology and molecular/materials science.Beilstein journal of nanotechnology · 2023Review
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Authors and funding
5 authors at 1 institution in 1 country.
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Abstract
We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest achieved feature dimension is 5 nm using a micrometer-scale structured stamp in a chemical lift-off lithography (CLL) process. Molecular patterns retained in the gaps between stamp features and their circumscribed or inscribed circles follow mathematical predictions, and their sizes can be tuned by altering the stamp structure dimensions, including height, pitch, and shape. These generated surface molecular patterns can function as biorecognition arrays or be transferred to the underneath Au layer for metallic structure creation. By combining CLL process with this gap phenomenon, soft material properties that are previously thought as demerits can be used to achieve sub-10 nm features in a straightforward sketch.
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