Evidence map›Paper›PMID 36653314›Full record

ArticleACS applied materials & interfaces2023

Tiling the Silicon for Added Functionality: PLD Growth of Highly Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface.

Zoran Jovanović, Urška Trstenjak, Hsin-Chia Ho, Olena Butsyk, Binbin Chen, Elena Tchernychova, Fedir Borodavka, Gertjan Koster, Jiří Hlinka, Matjaž Spreitzer

Abstract read
In one paragraph

Article in ACS applied materials & interfaces, 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Article
  2. Robust SrTiOACS applied materials & interfaces · 2023
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Zoran JovanovićAdvanced Materials Department, Jožef Stefan Institute, 1000 Ljubljana, Slovenia.ORCID 0000-0003-1727-4852
Urška TrstenjakAdvanced Materials Department, Jožef Stefan Institute, 1000 Ljubljana, Slovenia.ORCID 0000-0002-9447-1502
Hsin-Chia HoAdvanced Materials Department, Jožef Stefan Institute, 1000 Ljubljana, Slovenia.ORCID 0000-0001-6373-9740
Olena ButsykDepartment of Dielectrics, Institute of Physics of the Czech Academy of Sciences, 182 00 Prague, Czech Republic.
Binbin ChenMESA+ Institute for Nanotechnology, University of Twente, 7522 NB Enschede, The Netherlands.
Elena TchernychovaNational Institute of Chemistry, 1000 Ljubljana, Slovenia.
Fedir BorodavkaDepartment of Dielectrics, Institute of Physics of the Czech Academy of Sciences, 182 00 Prague, Czech Republic.ORCID 0000-0001-8605-1690
Gertjan KosterMESA+ Institute for Nanotechnology, University of Twente, 7522 NB Enschede, The Netherlands.ORCID 0000-0001-5478-7329
Jiří HlinkaDepartment of Dielectrics, Institute of Physics of the Czech Academy of Sciences, 182 00 Prague, Czech Republic.ORCID 0000-0002-9293-4462
Matjaž SpreitzerAdvanced Materials Department, Jožef Stefan Institute, 1000 Ljubljana, Slovenia.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The application of two-dimensional (2D) materials has alleviated a number of challenges of traditional epitaxy and pushed forward the integration of dissimilar materials. Besides acting as a seed layer for van der Waals epitaxy, the 2D materials─being atom(s) thick─have also enabled wetting transparency in which the potential field of the substrate, although partially screened, is still capable of imposing epitaxial overgrowth. One of the crucial steps in this technology is the preservation of the quality of 2D materials during and after their transfer to a substrate of interest. In the present study, we show that by honing the achievements of traditional epitaxy and wet chemistry a hybrid approach can be devised that offers a unique perspective for the integration of functional oxides with a silicon platform. It is based on SrO-assisted deoxidation and controllable coverage of silicon surface with a layer(s) of spin-coated graphene oxide, thus simultaneously allowing both direct and van der Waals epitaxy of SrTiO

Indexed as

added functionalityepitaxyPLD depositionPZTrGO buffer layerSTO pseudo-substrate

Identifiers

PMID36653314
PMCPMC9906728

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.