Evidence map›Paper›PMID 36616091›Full record

ArticleNanomaterials (Basel, Switzerland)2022

Silicon Nanowire-Assisted High Uniform Arrayed Waveguide Grating.

Shuo Yuan, Jijun Feng, Zhiheng Yu, Jian Chen, Haipeng Liu, Yishu Chen, Song Guo, Fengli Huang, Ryoichi Akimoto, Heping Zeng

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Review
  2. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Shuo YuanShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Jijun FengShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.ORCID 0000-0003-1896-971X
Zhiheng YuShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.ORCID 0000-0003-3656-031X
Jian ChenShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Haipeng LiuShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Yishu ChenShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Song GuoShanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Fengli HuangKey Laboratory of Medical Electronics and Digital Health of Zhejiang Province, Jiaxing University, Jiaxing 314001, China.
Ryoichi AkimotoResearch Institute for Advanced Electronics and Photonics, National Institute of Advanced Industrial Science and Technology, Tsukuba 305-8568, Japan.
Heping ZengChongqing Key Laboratory of Precision Optics, Chongqing Institute of East China Normal University, Chongqing 401120, China.ORCID 0000-0002-9025-9643

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Determining how to improve the non-uniformity of arrayed waveguide grating (AWG) is of great significance for dense wavelength division multiplexing (DWDM) systems. In this work, a silicon nanowire-assisted AWG structure is proposed, which can achieve high uniformity with a low insertion loss. The article compares the effect of nanowire number and shape on uniformity and insertion loss, finding that double nanowires provide the best performance. Double nanowires with a width of 230 nm and length of 3.5 μm can consist of a slot configuration between arrayed waveguides, both connecting to the star coupler and spacing 165 nm from the waveguides. Compared with conventional 8- and 16-channel AWGs with channel spacing of 200 GHz, the non-uniformity of the presented structure can be improved from 1.09 and 1.6 dB to 0.24 and 0.63 dB, respectively. The overall footprint of the device would remain identical, which is 276 × 299 or 258 × 303 μm

Indexed as

arrayed waveguide gratingnanowiresilicon photonicsuniformity

Identifiers

PMID36616091
PMCPMC9823391

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.