Evidence map›Paper›PMID 36614681›Full record

ArticleMaterials (Basel, Switzerland)2022

ITO Thin Films for Low-Resistance Gas Sensors.

Aleksei V Almaev, Viktor V Kopyev, Vadim A Novikov, Andrei V Chikiryaka, Nikita N Yakovlev, Abay B Usseinov, Zhakyp T Karipbayev, Abdirash T Akilbekov, Zhanymgul K Koishybayeva, Anatoli I Popov

Abstract read
In one paragraph

Article in Materials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.

0numbers the graph read from it
0cells of the map it votes in
7citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

7 citing papers in PubMed.

  1. HMicromachines · 2026
    Article
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  3. Article
  4. Article
  5. Electronic Structure of Mg-, Si-, and Zn-Doped SnOMaterials (Basel, Switzerland) · 2024
    Article
  6. Article
  7. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Aleksei V AlmaevResearch and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University, 634050 Tomsk, Russia.ORCID 0000-0002-3502-8770
Viktor V KopyevResearch and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University, 634050 Tomsk, Russia.
Vadim A NovikovResearch and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University, 634050 Tomsk, Russia.ORCID 0000-0002-2195-4060
Andrei V ChikiryakaIoffe Institute of the Russian Academy of Sciences, 194021 Saint Petersburg, Russia.
Nikita N YakovlevResearch and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University, 634050 Tomsk, Russia.ORCID 0000-0002-5190-0178
Abay B UsseinovFaculty of Physics and Technical Sciences, L.N. Gumilyov Eurasian National University, Astana 010008, Kazakhstan.ORCID 0000-0002-4066-8422
Zhakyp T KaripbayevFaculty of Physics and Technical Sciences, L.N. Gumilyov Eurasian National University, Astana 010008, Kazakhstan.ORCID 0000-0003-4066-1826
Abdirash T AkilbekovFaculty of Physics and Technical Sciences, L.N. Gumilyov Eurasian National University, Astana 010008, Kazakhstan.
Zhanymgul K KoishybayevaFaculty of Physics and Technical Sciences, L.N. Gumilyov Eurasian National University, Astana 010008, Kazakhstan.
Anatoli I PopovFaculty of Physics and Technical Sciences, L.N. Gumilyov Eurasian National University, Astana 010008, Kazakhstan.ORCID 0000-0003-2795-9361

Funding

Council for Grants of the President of the Russian Federation Decree of the Government of the Russian Federation No. 220 of 9 April 2010 (Agreement No. 075-15-2022-1132European Commission H2020-WIDESPREAD01-2016-2017-Teaming Phase2 under grant agreement No. 739508, project CAMART2.Ministry of Education and Science of the Republic of Kazakhstan AP08856540
6 · The paper itself

Abstract

Indium tin oxide thin films were deposited by magnetron sputtering on ceramic aluminum nitride substrates and were annealed at temperatures of 500 °C and 600 °C. The structural, optical, electrically conductive and gas-sensitive properties of indium tin oxide thin films were studied. The possibility of developing sensors with low nominal resistance and relatively high sensitivity to gases was shown. The resistance of indium tin oxide thin films annealed at 500 °C in pure dry air did not exceed 350 Ohms and dropped by about 2 times when increasing the annealing temperature to 100 °C. Indium tin oxide thin films annealed at 500 °C were characterized by high sensitivity to gases. The maximum responses to 2000 ppm hydrogen, 1000 ppm ammonia and 100 ppm nitrogen dioxide for these films were 2.21 arbitrary units, 2.39 arbitrary units and 2.14 arbitrary units at operating temperatures of 400 °C, 350 °C and 350 °C, respectively. These films were characterized by short response and recovery times. The drift of indium tin oxide thin-film gas-sensitive characteristics during cyclic exposure to reducing gases did not exceed 1%. A qualitative model of the sensory effect is proposed.

Indexed as

gas sensorsindium tin oxidethin films

Identifiers

PMID36614681
PMCPMC9822304

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.