Evidence map›Paper›PMID 36558302›Full record

ArticleNanomaterials (Basel, Switzerland)2022

Dislocation Filter Based on LT-GaAs Layers for Monolithic GaAs/Si Integration.

Mikhail O Petrushkov, Demid S Abramkin, Eugeny A Emelyanov, Mikhail A Putyato, Oleg S Komkov, Dmitrii D Firsov, Andrey V Vasev, Mikhail Yu Yesin, Askhat K Bakarov, Ivan D Loshkarev and 3 more

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.

0numbers the graph read from it
0cells of the map it votes in
4citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

4 citing papers in PubMed.

  1. Effect ofNanomaterials (Basel, Switzerland) · 2023
    Article
  2. Article
  3. Article
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

13 authors.

Mikhail O PetrushkovLaboratory of Physical Bases of Semiconductor Heterostructures Epitaxy, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0002-5713-1277
Demid S AbramkinLaboratory of Molecular Beam Epitaxy of A3B5 Compounds, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.
Eugeny A EmelyanovLaboratory of Physical Bases of Semiconductor Heterostructures Epitaxy, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0003-3700-506X
Mikhail A PutyatoLaboratory of Physical Bases of Semiconductor Heterostructures Epitaxy, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0001-9974-7144
Oleg S KomkovDepartment of Electronics, St. Petersburg Electrotechnical University "LETI", St. Petersburg 197022, Russia.
Dmitrii D FirsovDepartment of Electronics, St. Petersburg Electrotechnical University "LETI", St. Petersburg 197022, Russia.
Andrey V VasevLaboratory of Physical Bases of Semiconductor Heterostructures Epitaxy, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0001-7335-668X
Mikhail Yu YesinLaboratory of Molecular Beam Epitaxy of Elementary Semiconductors and A3B5 Compounds, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.
Askhat K BakarovLaboratory of Molecular Beam Epitaxy of A3B5 Compounds, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0002-0572-9648
Ivan D LoshkarevLaboratory of Molecular Beam Epitaxy of Elementary Semiconductors and A3B5 Compounds, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.
Anton K GutakovskiiLaboratory of Nanodiagnostics and Nanolithography, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0002-4712-8736
Victor V AtuchinLaboratory of Optical Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0002-7424-5604
Valery V PreobrazhenskiiLaboratory of Physical Bases of Semiconductor Heterostructures Epitaxy, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia.ORCID 0000-0002-7937-0113

Funding

Ministry of Science and Higher Education of the Russian Federation 075-15-2020-797 (13.1902.21.0024)
6 · The paper itself

Abstract

The use of low-temperature (LT) GaAs layers as dislocation filters in GaAs/Si heterostructures (HSs) was investigated in this study. The effects of intermediate LT-GaAs layers and of the post-growth and cyclic in situ annealing on the structural properties of GaAs/LT-GaAs/GaAs/Si(001) HSs were studied. It was found that the introduction of LT-GaAs layers, in combination with post-growth cyclic annealing, reduced the threading dislocation density down to 5 × 10

Indexed as

dislocation filterIII-V/Si integrationlow-temperature GaAsmolecular-beam epitaxyself-assembled quantum dots

Identifiers

PMID36558302
PMCPMC9782000

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.