Evidence map›Paper›PMID 36558297›Full record

ArticleNanomaterials (Basel, Switzerland)2022

Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes.

Tomáš Blecha, Zuzana Vlčková Živcová, Farjana J Sonia, Martin Mergl, Oleksandr Volochanskyi, Michal Bodnár, Pavel Rous, Kenichiro Mizohata, Martin Kalbáč, Otakar Frank

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Tomáš BlechaFaculty of Electrical Engineering, University of West Bohemia, Univerzitní 2795/8, 301 00 Pilsen, Czech Republic.ORCID 0000-0001-7257-6242
Zuzana Vlčková ŽivcováJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.
Farjana J SoniaJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.
Martin MerglJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.
Oleksandr VolochanskyiJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.
Michal BodnárTesla Blatná a.s., Palackého 644, 388 01 Blatná, Czech Republic.ORCID 0000-0001-7807-2168
Pavel RousFaculty of Electrical Engineering, University of West Bohemia, Univerzitní 2795/8, 301 00 Pilsen, Czech Republic.
Kenichiro MizohataDepartment of Physics, Helsinki University, P.O. Box 43, 00014 Helsinki, Finland.
Martin KalbáčJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.
Otakar FrankJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech Republic.ORCID 0000-0002-9661-6250

Funding

Ministry of Education Youth and Sports CZ.02.1.01/0.0/0.0/16_026/0008382University of West Bohemia SGS-2021-003
6 · The paper itself

Abstract

Contact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required. The issue of contact resistance is also addressed in connection with the increasingly frequently used carbon allotropes. This work aimed to determine the factors that influence contact resistance between graphene prepared by chemical vapour deposition and pre-patterned Cu and Au electrodes onto which graphene is subsequently transferred. It was found that electrode surface treatment methods affect the resistance between Cu and graphene, where contact resistance varied greatly, with an average of 1.25 ± 1.54 kΩ, whereas for the Au electrodes, the deposition techniques did not influence the resulting contact resistance, which decreased by almost two orders of magnitude compared with the Cu electrodes, to 0.03 ± 0.01 kΩ.

Indexed as

contact resistancegraphenegraphene–metal contacttransfer length method

Identifiers

PMID36558297
PMCPMC9780872

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.