Abridging CMOS Technology.

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

Who cites it

5 citing papers in PubMed.

1. Emerging Copper-to-Copper Bonding Techniques: Enabling High-Density Interconnects for Heterogeneous Integration.Nanomaterials (Basel, Switzerland) · 2025
   Review
2. Abridging the CMOS Technology II.Nanomaterials (Basel, Switzerland) · 2024
   Article
3. Contacts at the Nanoscale and for Nanomaterials.Nanomaterials (Basel, Switzerland) · 2024
   Review
4. Nature of the Metal Insulator Transition in High-Mobility 2D_Si-MOSFETs.Nanomaterials (Basel, Switzerland) · 2023
   Article
5. Poole-Frenkel (PF)-MOS: A Proposal for the Ultimate Scale of an MOS Transistor.Nanomaterials (Basel, Switzerland) · 2023
   Article

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

Authors and funding

1 author.

Funding

No grant is acknowledged in the PubMed record.

Abstract