Identification and classification of particle contaminants on photomasks based on individual-particle Raman scattering spectra and SEM images.

Dongxian Li, Tao Zhang, Weisheng Yue, Ping Gao, Yunfei Luo, Changtao Wang, Xiangang Luo

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Article in RSC advances, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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5 · Who and what money

Authors and funding

7 authors.

Dongxian LiState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Tao ZhangState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Weisheng YueState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Ping GaoState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Yunfei LuoState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Changtao WangState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.

Xiangang LuoState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences P.O. Box 350 Chengdu 610209 China lxg@ioe.ac.cn.ORCID https://orcid.org/0000-0002-1401-1670

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Particle contamination of photo masks is a significant issue facing the micro-nanofabrication process. It is necessary to analyze the particulate matter so that the contamination can be effectively controlled and eliminated. In this study, Raman spectroscopy was used in combination with scanning electron microscopy with energy analysis (SEM-EDX) techniques to study the contamination of individual particles on the photomask. From Raman spectroscopic analysis, the Raman bands of particles mainly contributed to the vibrational modes of the elements C, H, O, and N. Their morphology and elemental composition were determined by SEM-EDX. The sizes of the particles are mostly less than 0.8 μm according to the SEM image analysis. Hierarchical clustering analysis (HCA) of the Raman spectra of particles have shown that the particles can be classified into six clusters which are assigned to CaCO

Identifiers

PMID36425188

DOI10.1039/d2ra05672k

PMCPMC9679918

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.