Evidence map›Paper›PMID 36295909›Full record

ArticleMicromachines2022

The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF

Jong-Chang Woo, Doo-Seung Um

Abstract read
In one paragraph

Article in Micromachines, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

2 authors.

Jong-Chang WooDepartment of Semiconductor Process Equipment, Semiconductor Convergence Campus of Korea Polytechnic, Anseong-si 17550, Korea.ORCID 0000-0002-9650-4523
Doo-Seung UmDepartment of Electrical Engineering, Sejong University, Seoul 05006, Korea.ORCID 0000-0003-4085-4580

Funding

National Research Foundation of Korea 2020R1G1A1102692
6 · The paper itself

Abstract

The global RE100 campaign is attracting attention worldwide due to climate change caused by global warming, increasingly highlighting the efficiency of renewable energy. Texturing of photovoltaic devices increases the devices' efficiency by reducing light reflectance at their surfaces. This study introduces the change in light reflectance following the process conditions of plasma etching as a texturing process to increase the efficiency of photovoltaic cells. Isotropic etching was induced through plasma using SF

Indexed as

inverse moth-eye structurephotovoltaic efficiencyplasma etchingreflectancesurface roughnesstexturing

Identifiers

PMID36295909
PMCPMC9607972

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.