Evidence map›Paper›PMID 36014619›Full record

ReviewNanomaterials (Basel, Switzerland)2022

Evolution in Lithography Techniques: Microlithography to Nanolithography.

Ekta Sharma, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal, Anand Kumar

Abstract readReview
In one paragraph

Review in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 45 papers.

0numbers the graph read from it
0cells of the map it votes in
45citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

45 citing papers in PubMed.

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  13. Chemistry, Properties, and Patterning of Transparent and Conductive Materials.The journal of physical chemistry. C, Nanomaterials and interfaces · 2025
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Ekta SharmaDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.
Reena RathiDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.
Jaya MisharwalDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.
Bhavya SinhmarDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.
Suman KumariDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.
Jasvir DalalDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.ORCID 0000-0002-3340-5317
Anand KumarDeaprtment of Physics, Chaudhary Ranbir Singh University, Jind 126102, India.ORCID 0000-0002-8367-8698

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors, etc., have been developed to meet the necessities of people. All these devices have chips inside them fabricated using diodes, transistors, logic gates, and ICs. The patterning of the substrate which is used for the further development of these devices is done with the help of a technique known as lithography. In the present work, we have carried out a review on different types of lithographic techniques such as optical lithography, extreme ultraviolet lithography, electron beam lithography, X-ray lithography, and ion beam lithography. The evolution of these techniques with time and their application in device fabrication are discussed. The different exposure tools developed in the past decade to enhance the resolution of these devices are also discussed. Chemically amplified and non-chemically amplified resists with their bonding and thickness are discussed. Mask and maskless lithography techniques are discussed along with their merits and demerits. Device fabrication at micro and nano scale has been discussed. Advancements that can be made to improve the performance of these techniques are also suggested.

Indexed as

alignment markslithographymasknano-devicesresist

Identifiers

PMID36014619
PMCPMC9414268

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.