Evidence map›Paper›PMID 35910127›Full record

ArticleACS omega2022

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF

Francesco Ghezzi, Matteo Pedroni, Janez Kovač, Federica Causa, Anna Cremona, Mariano Anderle, Roberto Caniello, Silvia M Pietralunga, Espedito Vassallo

Abstract read
In one paragraph

Article in ACS omega, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Francesco GhezziIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.ORCID https://orcid.org/0000-0003-3363-5187
Matteo PedroniIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.
Janez KovačJozef Stefan Institute, Jamova cesta 39, Ljubljana 1000, Slovenia.ORCID https://orcid.org/0000-0002-4324-246X
Federica CausaIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.
Anna CremonaIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.
Mariano AnderleIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.
Roberto CanielloIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.
Silvia M PietralungaCNR, Istituto di Fotonica e Nanotecnologie, P.zza Leonardo da Vinci 32, Milan 20133, Italy.
Espedito VassalloIstituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The process of deep texturization of the crystalline silicon surface is intimately related to its promising diverse applications, such as bactericidal surfaces for integrated lab-on-chip devices and absorptive optical layers (black silicon-BSi). Surface structuring by a maskless texturization appeals as a cost-effective approach, which is up-scalable for large-area production. In the case of silicon, it occurs by means of reactive plasma processes (RIE-reactive-ion etching) using fluorocarbon CF

Identifiers

PMID35910127
PMCPMC9330092

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC-ND
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.