ArticleMaterials (Basel, Switzerland)2022
Characterization of Si and SiO
Article in Materials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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0 citing papers in PubMed, 4 citations in OpenAlex.
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Authors and funding
4 authors at 2 institutions in 1 country.
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Abstract
Particles emitted during manufacturing processes such as polishing can represent a serious danger for the environment and for occupational safety. The formation mechanisms responsible for these dust emissions include chip formation, friction at the tool/workpiece and chip/tool interfaces, shearing and cutting. These mechanisms thus depend on workpiece and tool properties, as well as the polishing conditions. In the case of granite polishing, particle emissions during polishing can contain chemical compounds such as silica, which represent harmful health risks for the worker. It is therefore important to characterize the particles emitted and to search for possible interactions between the particles (size and composition) and the machining conditions in order to find ways of reducing emissions at the source. In this study, an investigation was undertaken to characterize the particles emitted during granite polishing as a function of polishing conditions, type of granite, and abrasive grit sizes used. Scanning electron microscopy (SEM) was employed for particle morphology characterization and particle grain size and chemical composition were evaluated using X-ray diffraction (XRD) and energy dispersive X-ray (EDX) techniques, respectively. Results show that the influence of polishing speed and feed rate on particle emission depends mainly on the granite type used, providing useful information for controlling the polishing procedure, and thereby dust emission.
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