ArticleHardwareX2021
An automated chemical vapor deposition setup for 2D materials.
Article in HardwareX, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- Active cooling device: A flexible, lab-scale experimental unit to develop spatio-temporal temperature control strategies.HardwareX · 2026Article
- Integration of 2D Nanoporous Membranes in Microfluidic Devices.ACS omega · 2024Article
- Modification of kitchen blenders into controllable laboratory mixers for mechanochemical synthesis of atomically thin materials.HardwareX · 2023Article
Corrections and comments
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Authors and funding
4 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Chemical vapour deposition (CVD) provides a versatile and scalable route to synthesize various 2D materials. Lowering the barrier for access, customization, and cost of CVD equipment will benefit a large and multidisciplinary research community. We report an open-source and automated CVD setup which can be built incrementally to cover a large parameter space of CVD growth. Extensions are also discussed. The setup was validated by CVD graphene growth and characterization on Cu foils. The software controller forms a crucial part of the system. Its plug-in based approach for devices and abstraction of interactions as structured text, enables easy automation, extension, and accessibility. These features also allow the same controller core to be used for control of diverse laboratory equipment, of which we provide a couple of examples. Together, the hardware and software design provides an easy and versatile package for CVD setup, which can also be a starting point for several other automated instruments.
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Registered trials
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