ArticleLight, science & applications2022
Material-specific high-resolution table-top extreme ultraviolet microscopy.
Article in Light, science & applications, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.
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Who cites it
10 citing papers in PubMed.
- Soft X-ray imaging with coherence tomography in the water window spectral range using high-harmonic generation.Light, science & applications · 2026Article
- Material-Sensitive and Thickness-Resolved Transmission Imaging Using Coherent Extreme Ultraviolet Radiation.ACS photonics · 2025Article
- Roadmap for Quantum Nanophotonics with Free Electrons.ACS photonics · 2025Review
- Pushing the resolution limit of coherent diffractive imaging.Light, science & applications · 2025Article
- Machine learning-assisted high-throughput prediction and experimental validation of high-responsivity extreme ultraviolet detectors.Nature communications · 2025Article
- Ultra-broadband ptychography for dispersive samples.Nature communications · 2025Article
- Efficient generation of Bessel-Gauss attosecond pulse trains via nonadiabatic phase-matched high-order harmonics.Light, science & applications · 2025Article
- Vortex bifocusing of extreme ultraviolet using modified Fermat-spiral photon-sieve splitter.Nanophotonics (Berlin, Germany) · 2024Article
- Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation.Light, science & applications · 2024Article
- High-resolution and high-sensitivity X-ray ptychographic coherent diffraction imaging using the CITIUS detector.Journal of synchrotron radiation · 2023Article
Corrections and comments
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Authors and funding
12 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At the same time, EUV radiation has significantly larger penetration depths than electrons. It thus enables a nano-scale view into complex three-dimensional structures that are important for material science, semiconductor metrology, and next-generation nano-devices. Here, we present high-resolution and material-specific microscopy at 13.5 nm wavelength. We combine a highly stable, high photon-flux, table-top EUV source with an interferometrically stabilized ptychography setup. By utilizing structured EUV illumination, we overcome the limitations of conventional EUV focusing optics and demonstrate high-resolution microscopy at a half-pitch lateral resolution of 16 nm. Moreover, we propose mixed-state orthogonal probe relaxation ptychography, enabling robust phase-contrast imaging over wide fields of view and long acquisition times. In this way, the complex transmission of an integrated circuit is precisely reconstructed, allowing for the classification of the material composition of mesoscopic semiconductor systems.
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.