Evidence map›Paper›PMID 35441245›Full record

ArticleNano-micro letters2022

Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility.

Peng Yang, Jiajia Zha, Guoyun Gao, Long Zheng, Haoxin Huang, Yunpeng Xia, Songcen Xu, Tengfei Xiong, Zhuomin Zhang, Zhengbao Yang and 5 more

Abstract read
In one paragraph

Article in Nano-micro letters, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 16 papers.

0numbers the graph read from it
0cells of the map it votes in
16citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

16 citing papers in PubMed.

  1. Review
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  5. Recent Advances in Xenes Based FET for Biosensing Applications.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2025
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  14. AlNano-micro letters · 2022
    Article
  15. Fabrication and characterization of ZnO/SeFrontiers of optoelectronics · 2022
    Article
  16. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

15 authors.

Peng YangCollege of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, People's Republic of China.
Jiajia ZhaDepartment of Electrical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China. jiajiazha2-c@my.cityu.edu.hk.
Guoyun GaoDepartment of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong SAR, People's Republic of China.
Long ZhengDepartment of Chemistry, The Chinese University of Hong Kong, Hong Kong SAR, People's Republic of China.
Haoxin HuangDepartment of Electrical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Yunpeng XiaDepartment of Electrical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Songcen XuDepartment of Electrical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Tengfei XiongDepartment of Chemistry, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Zhuomin ZhangDepartment of Mechanical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Zhengbao YangDepartment of Mechanical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China.
Ye ChenDepartment of Chemistry, The Chinese University of Hong Kong, Hong Kong SAR, People's Republic of China.
Dong-Keun KiDepartment of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong SAR, People's Republic of China.
Juin J LiouCollege of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, People's Republic of China.
Wugang LiaoCollege of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, People's Republic of China. wgliao@szu.edu.cn.
Chaoliang TanDepartment of Electrical Engineering, City University of Hong Kong, Hong Kong SAR, People's Republic of China. chaoltan@cityu.edu.hk.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The lack of stable p-type van der Waals (vdW) semiconductors with high hole mobility severely impedes the step of low-dimensional materials entering the industrial circle. Although p-type black phosphorus (bP) and tellurium (Te) have shown promising hole mobilities, the instability under ambient conditions of bP and relatively low hole mobility of Te remain as daunting issues. Here we report the growth of high-quality Te nanobelts on atomically flat hexagonal boron nitride (h-BN) for high-performance p-type field-effect transistors (FETs). Importantly, the Te-based FET exhibits an ultrahigh hole mobility up to 1370 cm

Indexed as

Chemical vapor depositionField-effect transistorsHole mobilitySubstrate engineeringTellurium

Identifiers

PMID35441245
PMCPMC9018950

What OpenQuestion holds

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LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.