Evidence map›Paper›PMID 35407285›Full record

ArticleNanomaterials (Basel, Switzerland)2022

Structural Engineering Effects on Hump Characteristics of ZnO/InSnO Heterojunction Thin-Film Transistors.

Qi Li, Junchen Dong, Dedong Han, Dengqin Xu, Jingyi Wang, Yi Wang

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.

0numbers the graph read from it
0cells of the map it votes in
3citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

3 citing papers in PubMed.

  1. Article
  2. Article
  3. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

6 authors.

Qi LiInstitute of Microelectronics, Peking University, Beijing 100871, China.ORCID 0000-0001-8172-6716
Junchen DongSchool of Information & Communication Engineering, Beijing Information Science and Technology University, Beijing 100101, China.
Dedong HanInstitute of Microelectronics, Peking University, Beijing 100871, China.
Dengqin XuInstitute of Microelectronics, Peking University, Beijing 100871, China.
Jingyi WangInstitute of Microelectronics, Peking University, Beijing 100871, China.
Yi WangInstitute of Microelectronics, Peking University, Beijing 100871, China.

Funding

National Natural Science Foundation of China 62004003
6 · The paper itself

Abstract

Transparent conductive oxides (TCO) have been extensively investigated as channel materials for thin-film transistors (TFTs). In this study, highly transparent and conductive InSnO (ITO) and ZnO films were deposited, and their material properties were studied in detail. Meanwhile, we fabricated ZnO/ITO heterojunction TFTs, and explored the effects of channel structures on the hump characteristics of ZnO/ITO TFTs. We found that V

Indexed as

channel structurehump phenomenonInSnOthin-film transistorstransparent conductive oxidesZnO

Identifiers

PMID35407285
PMCPMC9000375

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.