ArticleACS applied nano materials2022
Perovskite-Compatible Electron-Beam-Lithography Process Based on Nonpolar Solvents for Single-Nanowire Devices.
Article in ACS applied nano materials, 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.
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Who cites it
7 citing papers in PubMed.
- Sub-Diffraction Nanolithography of Halide Perovskite via Reversible All-Optical Crystallization-Decomposition.Advanced materials (Deerfield Beach, Fla.) · 2026Article
- Scalable Manufacturing and Precise Patterning of Perovskites for Light-Emitting Diodes.Nano-micro letters · 2026Review
- Next-generation COVID-19 detection using a metasurface biosensor with machine learning-enhanced refractive index sensing.Scientific reports · 2025Article
- Article
- Controlled Ligand-Free Growth of Free-Standing CsPbBrACS omega · 2024Article
- Nanoscale X-ray Imaging of Composition and Ferroelastic Domains in Heterostructured Perovskite Nanowires: Implications for Optoelectronic Devices.ACS applied nano materials · 2023Article
- Free-Standing Metal Halide Perovskite Nanowire Arrays with Blue-Green Heterostructures.Nano letters · 2022Article
Corrections and comments
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Authors and funding
3 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Metal halide perovskites (MHPs) have been studied intensely as the active material for optoelectronic devices. Lithography methods for perovskites remain limited because of the solubility of perovskites in polar solvents. Here, we demonstrate an electron-beam-lithography process with a poly(methyl methacrylate) resist based on the nonpolar solvents
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Registered trials
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