ArticleNanomaterials (Basel, Switzerland)2022
A New Approach to the Formation of Nanosized Gold and Beryllium Films by Ion-Beam Sputtering Deposition.
Article in Nanomaterials (Basel, Switzerland), 2022. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
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6 citing papers in PubMed, 38 citations in OpenAlex.
- Novel Method for Realistically Simulating the Deposition of Thin Films from the Gas Phase and its Application to Study the Growth of Thin Gold Film on Crystalline Silicon.Journal of chemical theory and computation · 2025Article
- Advancements in Improving Selectivity of Metal Oxide Semiconductor Gas Sensors Opening New Perspectives for Their Application in Food Industry.Sensors (Basel, Switzerland) · 2023Review
- Magnetic Properties and Microstructure of FePt(BN, X, C) (X = Ag, Re) Films.Nanomaterials (Basel, Switzerland) · 2023Article
- Interface Engineering Enables High-Performance Sb Anode for Sodium Storage.Nanomaterials (Basel, Switzerland) · 2023Article
- Continuous Patterning of Silver Nanowire-Polyvinylpyrrolidone Composite Transparent Conductive Film by a Roll-to-Roll Selective Calendering Process.Nanomaterials (Basel, Switzerland) · 2022Article
- Reset First Resistive Switching in NiNanomaterials (Basel, Switzerland) · 2022Article
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Authors and funding
9 authors at 5 institutions in 4 countries.
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Abstract
Thin films of beryllium and gold that are several tens of nanometers thick were obtained, for the first time, on silicon and quartz substrates by the ion-beam method with tenfold alternation of deposition and partial sputtering of the nanosized metal layer. Scanning electron and atomic force microscopy indicate the predominant lateral growth of nanosized metal layers along the substrate surface. Optical spectra indicate the suppression of the localized plasmon resonance. The growth of the film occurs under the influence of the high-energy component of the sputtered metal atoms' flux. The main role in the formation of the nanosized metal film is played by the processes of the elastic collision of incident metal atoms with the atoms of a substrate and a growing metal film. Metal films that are obtained by the tenfold application of the deposition-sputtering of a nanoscale metal layer are characterized by stronger adhesion to the substrate and have better morphological, electrical, and optical characteristics than those that are obtained by means of direct single deposition.
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