Evidence map›Paper›PMID 34947631›Full record

ArticleNanomaterials (Basel, Switzerland)2021

The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology.

Guibai Xie, Hongwu Bai, Guanghui Miao, Guobao Feng, Jing Yang, Yun He, Xiaojun Li, Yun Li

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.

0numbers the graph read from it
0cells of the map it votes in
6citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

6 citing papers in PubMed.

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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Guibai XieNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Hongwu BaiNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Guanghui MiaoNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Guobao FengNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Jing YangNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Yun HeNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Xiaojun LiNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.
Yun LiNational Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry. In this paper, we report the applications of ultra-thin atomic layer deposition nanofilm in the advanced aerospace manufacturing industry, including aluminum anti-oxidation and secondary electron suppression, which are critical in high-power and miniaturization development. The compact and uniform aluminum oxide film, which is formed by thermal atomic layer deposition (ALD), can prevent the deep surface oxidation of aluminum during storage, avoiding the waste of material and energy in repetitive production. The total secondary electron yield of the C/TiN component nanofilm, deposited through plasma-enhanced atomic layer deposition, decreases 25% compared with an uncoated surface. The suppression of secondary electron emission is of great importance in solving the multipactor for high-power microwave components in space. Moreover, the controllable, ultra-thin uniform composite nanofilm can be deposited directly on the complex surface of devices without any transfer process, which is critical for many different applications. The ALD nanofilm shows potential for promoting system performance and resource consumption in the advanced aerospace manufacturing industry.

Indexed as

advanced manufacturingatomic layer deposition (ALD)nanofilmsecondary electrontitanium nitride

Identifiers

PMID34947631
PMCPMC8708582

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.