ArticleMicromachines2021
Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study.
Sang-Kon KimPubMed ↗Full text ↗Publisher ↗
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ArticleMicromachines2021
Sang-Kon KimPubMed ↗Full text ↗Publisher ↗
No numbers read from the abstract.