Evidence map›Paper›PMID 34825816›Full record

ArticleACS applied materials & interfaces2021

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films.

Milad Madadi, Juho Heiska, Jenna Multia, Maarit Karppinen

Abstract read
In one paragraph

Article in ACS applied materials & interfaces, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 8 papers.

0numbers the graph read from it
0cells of the map it votes in
8citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

8 citing papers in PubMed.

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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

Milad MadadiDepartment of Chemistry and Materials Science, Aalto University, FI-00076 Espoo, Finland.
Juho HeiskaDepartment of Chemistry and Materials Science, Aalto University, FI-00076 Espoo, Finland.ORCID https://orcid.org/0000-0001-5771-9444
Jenna MultiaDepartment of Chemistry and Materials Science, Aalto University, FI-00076 Espoo, Finland.
Maarit KarppinenDepartment of Chemistry and Materials Science, Aalto University, FI-00076 Espoo, Finland.ORCID https://orcid.org/0000-0003-1091-1169

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery. Since the pioneering work in 2009 for Li-containing thin films, the field has been rapidly growing and also widened from lithium to other alkali metals. Moreover, alkali-metal-based metal-organic thin films have been successfully grown by combining molecular layer deposition (MLD) cycles of the organic molecules with the ALD cycles of the alkali metal precursor. The current literature describes already around 100 ALD and ALD/MLD processes for alkali-metal-bearing materials. Interestingly, some of these materials cannot even be made by any other synthesis route. In this review, our intention is to present the current state of research in the field by (i) summarizing the ALD and ALD/MLD processes so far developed for the different alkali metals, (ii) highlighting the most intriguing thin-film materials obtained thereof, and (iii) addressing both the advantages and limitations of ALD and MLD in the application space of these materials. Finally, (iv) a brief outlook for the future perspectives and challenges of the field is given.

Indexed as

alkali metalsatomic layer depositionLi-ion batterymetal−organic hybridsmolecular layer depositionthin films

Identifiers

PMID34825816
PMCPMC8662639

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.