Evidence map›Paper›PMID 34578646›Full record

ArticleNanomaterials (Basel, Switzerland)2021

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography.

Angela Mihaela Baracu, Marius Andrei Avram, Carmen Breazu, Mihaela-Cristina Bunea, Marcela Socol, Anca Stanculescu, Elena Matei, Paul Conrad Vaagen Thrane, Christopher Andrew Dirdal, Adrian Dinescu and 1 more

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.

0numbers the graph read from it
0cells of the map it votes in
7citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

7 citing papers in PubMed.

  1. A Single-Layer Full-Color Diffractive Waveguide by Lithography.Nanomaterials (Basel, Switzerland) · 2025
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

11 authors.

Angela Mihaela BaracuNational Institute for Research and Development in Microtechnologies-IMT Bucharest, 126A, Erou Iancu Nicolae Street, 077190 Voluntari, Romania.ORCID 0000-0002-5791-1548
Marius Andrei AvramNational Institute for Research and Development in Microtechnologies-IMT Bucharest, 126A, Erou Iancu Nicolae Street, 077190 Voluntari, Romania.ORCID 0000-0003-0315-6599
Carmen BreazuNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.ORCID 0000-0002-4030-360X
Mihaela-Cristina BuneaNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.
Marcela SocolNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.ORCID 0000-0003-2010-7318
Anca StanculescuNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.ORCID 0000-0001-7755-1685
Elena MateiNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.ORCID 0000-0002-8387-2562
Paul Conrad Vaagen ThraneSINTEF Microsystems and Nanotechnology, Gaustadalleen 23C, 0737 Oslo, Norway.ORCID 0000-0001-5296-2912
Christopher Andrew DirdalSINTEF Microsystems and Nanotechnology, Gaustadalleen 23C, 0737 Oslo, Norway.
Adrian DinescuNational Institute for Research and Development in Microtechnologies-IMT Bucharest, 126A, Erou Iancu Nicolae Street, 077190 Voluntari, Romania.
Oana RasogaNational Institute of Materials Physics, 405 A, Atomistilor Street, P.O. Box M.G. 7, 077125 Magurele, Romania.ORCID 0000-0002-7901-0361

Funding

Unitatea Executiva pentru Finantarea Invatamantului Superior, a Cercetarii, Dezvoltarii si Inovarii EEA-RO-NO2018-0438
6 · The paper itself

Abstract

This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The designed metasurface makes use of the geometrical phase principle and consists of rectangular pillars with target dimensions of height h = 1200 nm, width w = 230 nm, length l = 354 nm and periodicity

Indexed as

cryogenic etching processEBL patterningstamp fabricationUV-NIL patterning

Identifiers

PMID34578646
PMCPMC8467467

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.