Evidence map›Paper›PMID 34578520›Full record

ArticleNanomaterials (Basel, Switzerland)2021

Oxygen Concentration Effect on Conductive Bridge Random Access Memory of InWZnO Thin Film.

Chih-Chieh Hsu, Po-Tsun Liu, Kai-Jhih Gan, Dun-Bao Ruan, Simon M Sze

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Article
  2. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Chih-Chieh HsuDepartment of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.ORCID 0000-0002-5963-8047
Po-Tsun LiuDepartment of Photonics and Institute of Electro-Optical Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.ORCID 0000-0001-8560-3668
Kai-Jhih GanDepartment of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
Dun-Bao RuanDepartment of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.ORCID 0000-0001-6939-5723
Simon M SzeDepartment of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.

Funding

Ministry of Science and Technology, Taiwan MOST109-2221-E-009-160-MY3Ministry of Science and Technology, Taiwan MOST110-2218-E-A49-012-MBKMinistry of Science and Technology, Taiwan MOST110-2218-E-A49-013-MBK
6 · The paper itself

Abstract

In this study, the influence of oxygen concentration in InWZnO (IWZO), which was used as the switching layer of conductive bridge random access memory, (CBRAM) is investigated. With different oxygen flow during the sputtering process, the IWZO film can be fabricated with different oxygen concentrations and different oxygen vacancy distribution. In addition, the electrical characteristics of CBRAM device with different oxygen concentration are compared and further analyzed with an atomic force microscope and X-ray photoelectron spectrum. Furthermore, a stacking structure with different bilayer switching is also systematically discussed. Compared with an interchange stacking layer and other single layer memory, the CBRAM with specific stacking sequence of bilayer oxygen-poor/-rich IWZO (IWZOx/IWZOy, x < y) exhibits more stable distribution of a resistance state and also better endurance (more than 3 × 10

Indexed as

bilayer switching layerconductive-bridge RAM (CBRAM)defect distributionendurance cycleInWZnO

Identifiers

PMID34578520
PMCPMC8466751

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.