Evidence map›Paper›PMID 34502998›Full record

ArticlePolymers2021

Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment.

Alba Martínez, Sandra González-Lana, Laura Asín, Jesús M de la Fuente, Cees W M Bastiaansen, Dirk J Broer, Carlos Sánchez-Somolinos

Abstract read
In one paragraph

Article in Polymers, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Article
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Alba MartínezInstituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, Advanced Manufacturing Laboratory, Departamento de Física de la Materia Condensada, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.
Sandra González-LanaInstituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, Advanced Manufacturing Laboratory, Departamento de Física de la Materia Condensada, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.
Laura AsínInstituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.
Jesús M de la FuenteInstituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.ORCID 0000-0003-1081-8482
Cees W M BastiaansenFaculty of Chemistry and Chemical Engineering, Eindhoven University, P.O. Box 513, 5600 Eindhoven, The Netherlands.
Dirk J BroerFaculty of Chemistry and Chemical Engineering, Eindhoven University, P.O. Box 513, 5600 Eindhoven, The Netherlands.
Carlos Sánchez-SomolinosInstituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, Advanced Manufacturing Laboratory, Departamento de Física de la Materia Condensada, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.ORCID 0000-0003-3900-2866

Funding

European Regional Development Fund FEDERGobierno de Aragón Grupos Gobierno de AragónMinisterio de Ciencia e Innovación BIO2017-84246-C2-1-RMinisterio de Economía y Competitividad DI-17-09585
6 · The paper itself

Abstract

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature. The surface relief structures generated using this modified photoembossing protocol are compared with those generated using the conventional one. Importantly, the enhancement of surface relief height has been observed by exposing the samples directly at the development temperature, reaching approximately double relief heights when compared to samples obtained using the conventional protocol. Advantageously, the light dose needed to reach the optimum height and the amount of photoinitiator can be substantially reduced in this modified protocol, demonstrating it to be a more efficient process for surface relief generation in photopolymers. Kidney epithelial cell alignment studies on substrates with relief-height optimized structures generated using the two described protocols demonstrate improved cell alignment in samples generated with exposure directly at the development temperature, highlighting the relevance of the height enhancement reached by this method. Although cell alignment is well-known to be enhanced by increasing the relief height of the polymeric grating, our work demonstrates nano-second laser interference photoembossing as a powerful tool to easily prepare polymeric gratings with tunable topography in the range of interest for fundamental cell alignment studies.

Indexed as

cell alignmentcell morphologyinterference holographymicrostructuringphotoembossingphotopolymers

Identifiers

PMID34502998
PMCPMC8434024

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.