Evidence map›Paper›PMID 34442473›Full record

ArticleMicromachines2021

Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication.

Mikhail V Pugachev, Aliaksandr I Duleba, Arslan A Galiullin, Aleksandr Y Kuntsevich

Abstract read
In one paragraph

Article in Micromachines, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.

0numbers the graph read from it
0cells of the map it votes in
6citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

6 citing papers in PubMed.

  1. Article
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  5. Review
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

Mikhail V PugachevP.N. Lebedev Physical Institute of the Russian Academy of Science, 119991 Moscow, Russia.
Aliaksandr I DulebaP.N. Lebedev Physical Institute of the Russian Academy of Science, 119991 Moscow, Russia.
Arslan A GaliullinDepartment of Physics, National Research University The Higher School of Economics, 101000 Moscow, Russia.ORCID 0000-0002-4504-2189
Aleksandr Y KuntsevichP.N. Lebedev Physical Institute of the Russian Academy of Science, 119991 Moscow, Russia.ORCID 0000-0003-0302-2320

Funding

Government of the Russian Federation 075-15-2021-59
6 · The paper itself

Abstract

The fast and precise fabrication of micro-devices based on single flakes of novel 2D materials and stacked heterostructures is vital for exploration of novel functionalities. In this paper, we demonstrate a fast high-resolution contact mask lithography through a simple upgrade of metallographic optical microscope. Suggested kit for the micromask lithography is compact and easily compatible with a glove box, thus being suitable for a wide range of air-unstable materials. The shadow masks could be either ordered commercially or fabricated in a laboratory using a beam lithography. The processes of the mask alignment and the resist exposure take a few minutes and provide a micrometer resolution. With the total price of the kit components around USD 200, our approach would be convenient for laboratories with the limited access to commercial lithographic systems.

Indexed as

2D materialslithographymask lithographynanoelectronicsVan der Waals heterostructures

Identifiers

PMID34442473
PMCPMC8397995

What OpenQuestion holds

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LicenceCC BY
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.