Evidence map›Paper›PMID 34306982›Full record

ReviewAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2021

Engineering Copper Iodide (CuI) for Multifunctional p-Type Transparent Semiconductors and Conductors.

Ao Liu, Huihui Zhu, Myung-Gil Kim, Junghwan Kim, Yong-Young Noh

Abstract readReview
In one paragraph

Review in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 20 papers.

0numbers the graph read from it
0cells of the map it votes in
20citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

20 citing papers in PubMed.

  1. Lattice Disorder in CuI Enables Filament-Free Transparent Memristors.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2026
    Article
  2. Review
  3. Review
  4. Review
  5. Article
  6. Article
  7. Article
  8. Article
  9. Review
  10. Article
  11. Thermoelectric Sensor with CuI Supported on Rough Glass.Nanomaterials (Basel, Switzerland) · 2024
    Article
  12. Limits to Hole Mobility and Doping in Copper Iodide.Chemistry of materials : a publication of the American Chemical Society · 2023
    Article
  13. Article
  14. Article
  15. Article
  16. Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2022
    Review
  17. Research Progress of p-Type Oxide Thin-Film Transistors.Materials (Basel, Switzerland) · 2022
    Review
  18. Article
  19. Article
  20. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Ao LiuDepartment of Chemical Engineering Pohang University of Science and Technology (POSTECH) Pohang Gyeongbuk 37673 Republic of Korea.
Huihui ZhuDepartment of Chemical Engineering Pohang University of Science and Technology (POSTECH) Pohang Gyeongbuk 37673 Republic of Korea.
Myung-Gil KimSchool of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 16419 Republic of Korea.
Junghwan KimMaterials Research Center for Element Strategy Tokyo Institute of Technology Mailbox SE-6, 4259 Nagatsuta, Midori-ku Yokohama 226-8503 Japan.
Yong-Young NohDepartment of Chemical Engineering Pohang University of Science and Technology (POSTECH) Pohang Gyeongbuk 37673 Republic of Korea.ORCID https://orcid.org/0000-0001-7222-2401

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Developing transparent p-type semiconductors and conductors has attracted significant interest in both academia and industry because metal oxides only show efficient n-type characteristics at room temperature. Among the different candidates, copper iodide (CuI) is one of the most promising p-type materials because of its widely adjustable conductivity from transparent electrodes to semiconducting layers in transistors. CuI can form thin films with high transparency in the visible light region using various low-temperature deposition techniques. This progress report aims to provide a basic understanding of CuI-based materials and recent progress in the development of various devices. The first section provides a brief introduction to CuI with respect to electronic structure, defect states, charge transport physics, and overviews the CuI film deposition methods. The material design concepts through doping/alloying approaches to adjust the optoelectrical properties are also discussed in the first section. The following section presents recent advances in state-of-the-art CuI-based devices, including transparent electrodes, thermoelectric devices, p-n diodes, p-channel transistors, light emitting diodes, and solar cells. In conclusion, current challenges and perspective opportunities are highlighted.

Indexed as

copper iodideinorganic p‐type semiconductorsthin‐film transistorstransparent conductors

Identifiers

PMID34306982
PMCPMC8292905

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.