ArticleMicromachines2021
Integrated Double-Sided Random Microlens Array Used for Laser Beam Homogenization.
Article in Micromachines, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
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6 citing papers in PubMed.
- Influence of Lithography Process Parameters on Continuous Surface Diffractive Optical Elements for Laser Beam Shaping.Micromachines · 2025Article
- Alignment error modeling and control of a double-sided microlens array during precision glass molding.Microsystems & nanoengineering · 2024Article
- Single Quasi-Symmetrical LED with High Intensity and Wide Beam Width Using Diamond-Shaped Mirror Refraction Method for Surgical Fluorescence Microscope Applications.Diagnostics (Basel, Switzerland) · 2023Article
- A 256 × 256 LiDAR Imaging System Based on a 200 mW SPAD-Based SoC with Microlens Array and Lightweight RGB-Guided Depth Completion Neural Network.Sensors (Basel, Switzerland) · 2023Article
- Simulation and Experimental Research on a Beam Homogenization System of a Semiconductor Laser.Sensors (Basel, Switzerland) · 2022Article
- Fabrication of Multifocal Microlens Array by One Step Exposure Process.Micromachines · 2021Article
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7 authors.
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Abstract
Double microlens arrays (MLAs) in series can be used to divide and superpose laser beam so as to achieve a homogenized spot. However, for laser beam homogenization with high coherence, the periodic lattice distribution in the homogenized spot will be generated due to the periodicity of the traditional MLA, which greatly reduces the uniformity of the homogenized spot. To solve this problem, a monolithic and highly integrated double-sided random microlens array (D-rMLA) is proposed for the purpose of achieving laser beam homogenization. The periodicity of the MLA is disturbed by the closely arranged microlens structures with random apertures. And the random speckle field is achieved to improve the uniformity of the homogenized spot by the superposition of the divided sub-beams. In addition, the double-sided exposure technique is proposed to prepare the rMLA on both sides of the same substrate with high precision alignment to form an integrated D-rMLA structure, which avoids the strict alignment problem in the installation process of traditional discrete MLAs. Then the laser beam homogenization experiments have been carried out by using the prepared D-rMLA structure. The laser beam homogenized spots of different wavelengths have been tested, including the wavelengths of 650 nm (R), 532 nm (G), and 405 nm (B). The experimental results show that the uniformity of the RGB homogenized spots is about 91%, 89%, and 90%. And the energy utilization rate is about 89%, 87%, 86%, respectively. Hence, the prepared structure has high laser beam homogenization ability and energy utilization rate, which is suitable for wide wavelength regime.
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