Evidence map›Paper›PMID 33920632›Full record

ArticleMaterials (Basel, Switzerland)2021

One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma.

Ho-Won Yoon, Seung-Min Shin, Seong-Yong Kwon, Hyun-Min Cho, Sang-Gab Kim, Mun-Pyo Hong

Abstract read
In one paragraph

Article in Materials (Basel, Switzerland), 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.

0numbers the graph read from it
0cells of the map it votes in
3citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

3 citing papers in PubMed.

  1. Article
  2. Article
  3. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

6 authors.

Ho-Won YoonDepartment of Applied Physics, Korea University, 2511 Sejong-ro, Sejong 30019, Korea.
Seung-Min ShinDepartment of Applied Physics, Korea University, 2511 Sejong-ro, Sejong 30019, Korea.ORCID 0000-0003-1496-3708
Seong-Yong KwonDepartment of Applied Physics, Korea University, 2511 Sejong-ro, Sejong 30019, Korea.
Hyun-Min ChoProcess Research Team, Samsung Display, 1, Samsung-ro, Giheung-gu, Yongin-si 17113, Korea.
Sang-Gab KimProcess Research Team, Samsung Display, 1, Samsung-ro, Giheung-gu, Yongin-si 17113, Korea.
Mun-Pyo HongDepartment of Applied Physics, Korea University, 2511 Sejong-ro, Sejong 30019, Korea.ORCID 0000-0003-4447-5705

Funding

Korea Institute of Energy Technology Evaluation and Planning 20204030200070Samsung Display Co., Ltd Q1615173
6 · The paper itself

Abstract

This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a combination of H

Indexed as

ECR-RIEH2/HCl gasITO/Ag/ITO multilayerone-step dry etchTE-OLED

Identifiers

PMID33920632
PMCPMC8073132

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.