ArticleScientific reports2021
Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices.
Article in Scientific reports, 2021. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.
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Who cites it
7 citing papers in PubMed.
- Promoted Current Injection in GaInN/GaN Multi-Quantum Nanowire-Based LEDs Coated With AZO Using Atomic Layer Deposition.Nanophotonics (Berlin, Germany) · 2026Article
- Photocatalytic Degradation of Brilliant Blue Dye Under Solar Light Irradiation: An Insight Into Mechanistic, Kinetics, Mineralization and Scavenging Studies.Journal of fluorescence · 2025Article
- Exploring resistive switching in flexible, forming-free Ti/NiO/AZO/PET memory device for future wearable electronics.Scientific reports · 2025Article
- A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications.Nanomaterials (Basel, Switzerland) · 2024Review
- Progress in the Synthesis and Application of Transparent Conducting Film of AZO (ZnO:Al).Materials (Basel, Switzerland) · 2023Review
- Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process.Nanomaterials (Basel, Switzerland) · 2022Article
- Liquid-Phase Synthesis of Nano-Zinc Oxide and Its Photocatalytic Property.International journal of analytical chemistry · 2022Article
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Authors and funding
5 authors.
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Abstract
This work reports investigation on the deposition and evaluation of an aluminum-doped zinc oxide (AZO) thin film and its novel applications to micro- and nano-devices. The AZO thin film is deposited successfully by atomic layer deposition (ALD). 50 nm-thick AZO film with high uniformity is checked by scanning electron microscopy. The element composition of the deposited film with various aluminum dopant concentration is analyzed by energy-dispersive X-ray spectroscopy. In addition, a polycrystalline feature of the deposited film is confirmed by selected area electron diffraction and high-resolution transmission electron microscopy. The lowest sheet resistance of the deposited AZO film is found at 0.7 kΩ/□ with the aluminum dopant concentration at 5 at.%. A novel method employed the ALD in combination with the sacrificial silicon structures is proposed which opens the way to create the ultra-high aspect ratio AZO structures. Moreover, based on this finding, three kinds of micro- and nano-devices employing the deposited AZO thin film have been proposed and demonstrated. Firstly, nanowalled micro-hollows with an aspect ratio of 300 and a height of 15 µm are successfully produced . Secondly, micro- and nano-fluidics, including a hollow fluidic channel with a nanowall structure as a resonator and a fluidic capillary window as an optical modulator is proposed and demonstrated. Lastly, nanomechanical resonators consisting of a bridged nanobeam structure and a vertical nanomechanical capacitive resonator are fabricated and evaluated.
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