ArticleMaterials (Basel, Switzerland)2020
Influence of Co-Sputtered Ag:Al Ultra-Thin Layers in Transparent V
Article in Materials (Basel, Switzerland), 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
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Who cites it
6 citing papers in PubMed.
- Poly(amidoamine) Dendrimer as an Interfacial Dipole Modification in Crystalline Silicon Solar Cells.The journal of physical chemistry letters · 2023Article
- Impact of Graphene Monolayer on the Performance of Non-Conventional Silicon Heterojunction Solar Cells with MoOMaterials (Basel, Switzerland) · 2023Article
- Thermal Transport in Extremely Confined Metallic Nanostructures: TET Characterization.Nanomaterials (Basel, Switzerland) · 2022Review
- Electrically Tunable Solution-Processed Transparent Conductive Thin Films Based on Colloidally Dispersed ITO@Ag Composite Ink.Nanomaterials (Basel, Switzerland) · 2022Article
- Functional optical design of thickness-optimized transparent conductive dielectric-metal-dielectric plasmonic structure.Scientific reports · 2022Article
- Aluminum Doping Effect on Surface Structure of Silver Ultrathin Films.Materials (Basel, Switzerland) · 2022Article
Corrections and comments
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Authors and funding
8 authors.
Funding
Abstract
As optoelectronic devices continue to improve, control over film thickness has become crucial, especially in applications that require ultra-thin films. A variety of undesired effects may arise depending on the specific growth mechanism of each material, for instance a percolation threshold thickness is present in Volmer-Webber growth of materials such as silver. In this paper, we explore the introduction of aluminum in silver films as a mechanism to grow ultrathin metallic films of high transparency and low sheet resistance, suitable for many optoelectronic applications. Furthermore, we implemented such ultra-thin metallic films in Dielectric/Metal/Dielectric (DMD) structures based on Aluminum-doped Zinc Oxide (AZO) as the dielectric with an ultra-thin silver aluminum (Ag:Al) metallic interlayer. The multilayer structures were deposited by magnetron sputtering, which offers an industrial advantage and superior reliability over thermally evaporated DMDs. Finally, we tested the optimized DMD structures as a front contact for n-type silicon solar cells by introducing a hole-selective vanadium pentoxide (V
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