ArticlePolymers2020
Investigation of Interface Thermal Resistance between Polymer and Mold Insert in Micro-Injection Molding by Non-Equilibrium Molecular Dynamics.
Article in Polymers, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
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Who cites it
4 citing papers in PubMed.
- Mechanistic Structure-Property Relationships in Carbon/Polymer Composites: Connectivity, Junction Resistance, and Durability.Polymers · 2026Review
- Directional Migration and Distribution of Magnetic Microparticles in Polypropylene-Matrix Magnetic Composites Molded by an Injection Molding Assisted by External Magnetic Field.Materials (Basel, Switzerland) · 2022Article
- Research on Quality Characterization Method of Micro-Injection Products Based on Cavity Pressure.Polymers · 2021Article
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5 authors.
Funding
Abstract
Micro-injection molding has attracted a wide range of research interests to fabricate polymer products with nanostructures for its advantages of cheap and fast production. The heat transfer between the polymer and the mold insert is important to the performance of products. In this study, the interface thermal resistance (ITR) between the polypropylene (PP) layer and the nickel (Ni) mold insert layer in micro-injection molding was studied by using the method of non-equilibrium molecular dynamics (NEMD) simulation. The relationships among the ITR, the temperature, the packing pressure, the interface morphology, and the interface interaction were investigated. The simulation results showed that the ITR decreased obviously with the increase of the temperature, the packing pressure and the interface interaction. Both rectangle and triangle interface morphologies could enhance the heat transfer compared with the smooth interface. Moreover, the ITR of triangle interface was higher than that of rectangle interface. Based on the analysis of phonon density of states (DOS) for PP-Ni system, it was found that the mismatch between the phonon DOS of the PP atoms and Ni atoms was the main cause of the interface resistance. The frequency distribution of phonon DOS also affected the interface resistance.
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