ArticleMaterials (Basel, Switzerland)2020
Fabrication and Characterization of Oxygenated AlN/4H-SiC Heterojunction Diodes.
Article in Materials (Basel, Switzerland), 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
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Who cites it
2 citing papers in PubMed.
- Carbothermal Reduction Synthesis of Aluminum Nitride from Al(OH)Materials (Basel, Switzerland) · 2021Article
- Influence of Gas Annealing on Sensitivity of AlN/4H-Sic-Based Temperature Sensors.Materials (Basel, Switzerland) · 2021Article
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4 authors.
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Abstract
The effects of rapid thermal annealing (RTA) on Schottky barrier diodes (SBDs) made from oxygenated aluminum nitride (AlN) thin films deposited on a silicon carbide (SiC) substrate using radio frequency sputtering were investigated. The annealed SBD devices exhibited a 10x increase in the on/off current ratio vs. non-annealed devices for measurement temperatures ranging from 300 K to 450 K. The ideality factor, derived from the current density-voltage (J-V) characterization, increased by a factor of ~2.2 after annealing, whereas the barrier height decreased from ~0.91 to ~0.68 eV. Additionally, Auger electron spectroscopy indicated decreased concentrations of atomic oxygen in the AlN thin film, from ~36% before, to ~24% after annealing. This may have contributed to the reduced barrier height and improved on/off ratio in the annealed AlN/SiC diodes.
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