Evidence map›Paper›PMID 32961900›Full record

ArticleMicromachines2020

Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching.

Zhitian Shi, Konstantins Jefimovs, Lucia Romano, Marco Stampanoni

Abstract read
In one paragraph

Article in Micromachines, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 19 papers.

0numbers the graph read from it
0cells of the map it votes in
19citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

19 citing papers in PubMed.

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  16. Dark-field computed tomography reaches the human scale.Proceedings of the National Academy of Sciences of the United States of America · 2022
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

Zhitian ShiPaul Scherrer Institut, 5232 Villigen PSI, Switzerland.ORCID 0000-0003-0539-219X
Konstantins JefimovsPaul Scherrer Institut, 5232 Villigen PSI, Switzerland.
Lucia RomanoPaul Scherrer Institut, 5232 Villigen PSI, Switzerland.ORCID 0000-0002-7696-7643
Marco StampanoniPaul Scherrer Institut, 5232 Villigen PSI, Switzerland.

Funding

European Research Council ERC-2012-StG 31'0005 "PhaseX"European Research Council ERC-2016-PoC 727246 "Magic"Eurostars E!1106 "INFORMAT"Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung CRSII5_18356 "Clinical GI-BCT"SwissLOS of the Kanton of Aargau and Fondazione Gelu TACI-C ProjectSwiss Nanoscience Institute NanoArgovia Grant 13.01 "NANOCREATE"
6 · The paper itself

Abstract

The key optical components of X-ray grating interferometry are gratings, whose profile requirements play the most critical role in acquiring high quality images. The difficulty of etching grating lines with high aspect ratios when the pitch is in the range of a few micrometers has greatly limited imaging applications based on X-ray grating interferometry. A high etching rate with low aspect ratio dependence is crucial for higher X-ray energy applications and good profile control by deep reactive ion etching of grating patterns. To achieve this goal, a modified Coburn-Winters model was applied in order to study the influence of key etching parameters, such as chamber pressure and etching power. The recipe for deep reactive ion etching was carefully fine-tuned based on the experimental results. Silicon gratings with an area of 70 × 70 mm

Indexed as

aspect ratio dependent etching (ARDE)X-ray energy rangeX-ray grating interferometry

Identifiers

PMID32961900
PMCPMC7570153

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.